After the epidemic, people are more aware of the importance of disinfection in daily life, and the demand for disinfection technology is also increasing.Traditional disinfection methods can no longer meet people’s requirements. Therefore, a disinfection technology called “Far UVC” has begun to receive more and more attention. This technology has a very short wavelength of only 222 nanometers and has high disinfection efficiency and safety. As one of the far ultraviolet technologies, the advantages of Far UVC 222nm have been widely recognized and applied.

Far UVC 222nm can destroy bacteria, viruses, and fungi in the air, and it has been recently discovered that Far UVC 222nm can also destroy the new coronavirus in droplets. This study result is exciting. In addition, Far UVC 222nm is widely used in the disinfection and purification of hospitals, public places, transportation hubs, and production lines.

Far UVC 222nm has two major advantages in application. First, its short wavelength can quickly disinfect while not causing harm to human bodies or objects, making it a safer and more effective disinfection technology. The second advantage is that Far UVC 222nm’s application is very flexible. It can not only appear in the form of wall-mounted or handheld disinfection products but also be applied to the field of air purification. Many air purifiers have started to use Far UVC 222nm technology for disinfection and purification, effectively improving the product’s effectiveness in air purification. This also provides broad prospects for future applications.

The rapid development of the far ultraviolet industry has driven the maturity and application of Far UVC 222nm technology. The continuous emergence of new applications also promotes the continuous innovation of Far UVC 222nm technology, and it is also continuously being improved in terms of safety. Far UVC 222nm will undoubtedly become one of the most promising disinfection technologies in the future, providing consumers with safer living places and products.

About the author : Lumens

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